极大3限制边连通二部图的充分条件

设G=(V,E)是一个连通图.称一个边集合S■E是一个k限制边割,如果G-S的每个连通分支至少有k个顶点.称G的所有k限制边割中所含边数最少的边割的基数为G的k限制边连通度,记为λ_k(G).定义ξ_k(G)=min{[X,■]:|X|=k,G[X]连通,■=V(G)\X}.称图G是极大k限制边连通的,如果λ_k(G)=ξ_k(G).本文给出了围长为g>6的极大3限制边连通二部图的充分条件.     

Multi-scale finite element simulation on large deformation behavior of wood under axial and transverse compression conditions

Acta Mechanica Sinica - Multi-scale finite element method is adopted to simulate wood compression behavior under axial and transverse loading. Representative volume elements (RVE) of wood...     

Lower Bounds for the Robustness of Multilevel Coherence

International Journal of Theoretical Physics - Quantum coherence, coming from quantum superposition, occupies a significant position in the field of physics. We put forward a lower bound of the...     

Optimal control of an SIQRS epidemic model with three measures on networks

Nonlinear Dynamics - At present, the main measures for disease control are vaccination, quarantine and treatment. Taking the three measures into consideration, time-varying optimal control problems...     

电机驱动微装配在双光子制备微结构中的应用

对微结构的制作、微装配系统进行了研究. 采用飞秒激光双光子聚合微加工技术制作有底座、精细的三维立体“拱形”微结构, 其高250μm、长300μm、厚50μm. 将此微结构与实验室自主搭建的二维微装配平台相结合, 利用自主编程的人机交互界面驱动步进电机, 远程操控微装配设备; 将荧光闪烁陶瓷粉末装配到微结构中, 对装配后的微结构进行荧光光谱表征发现, 纯荧光粉末和微结构中的荧光粉末的发射光谱在测量误差范围内基本一致, 表明荧光粉末的光学性质未发生改变. 利用该装置可以将各类微纳米级材料和微结构进行装配, 形成含有不同材料的微结构系统.     

CCSD(T) study on the structures and chemical bonds of AnO molecules (An = Bk–Lr)

The molecular geometries and dissociation energies of AnO (An = Bk–Lr) molecules were first obtained at thecoupled-cluster single-, double-, and perturbative triple-excitations [CCSD(T)] level of theory. Four hybrid functionals,B3LYP, M06-2X, TPSSh, and PBE0, were also employed in the calculations for the sake of comparison. In comparison ofthe CCSD(T) results, B3LYP, TPSSh, and PBE0 functionals can obtain more appropriate results than M06-2X and MP2.The analyses on molecular orbitals show that the 7s, 6d, and 5f atomic orbitals of actinide (An) atoms participate in thebonding of An–O bonds. The partial covalent nature between An and O atoms is revealed by QTAIM analyses.     

Virtual Field Characterization for Ratcheting Effect Under Cyclic Loading

Experimental Mechanics - Ratcheting is an important mechanical behavior of metals and alloys, which is caused by the repeated accumulations of tensile and compressive strain in circle load....     

基于耦合声场建模的膨胀腔消声器声学性能分析及试验

针对圆柱形膨胀腔消声器三维建模及声学性能分析问题, 提出一种基于切比雪夫变分原理的耦合声场建模方法, 建立三维圆柱形膨胀腔消声器理论模型并搭建试验台架, 传递损失试验结果验证了理论模型的准确性. 将膨胀腔消声器内部声场分解为多个子声场, 基于子声场间压力与质点振速连续性条件, 推导声场耦合变分公式, 构建子声场拉格朗日泛函. 将子声场声压函数展开为切比雪夫-傅里叶级数形式, 通过瑞利-里兹法求解膨胀腔消声器频率、声压响应及传递损失. 计算并对比分析扩张比、扩张腔长度、进出口管偏置对膨胀腔消声器消声性能的影响. 结果表明: 扩张比增大会有效提高消声器在低频段的消声性能, 进出口管的偏置对消声器消声性能影响很小.     

Monitoring the Thiol/Thiophenol Molecule-Modulated Plasmon-Mediated Silver Oxidation with Dark-Field Optical Microscopy

Surface plasmon can trigger or accelerate many photochemical reactions, especially useful in energy and environmental industries. Recently, molecular adsorption has proven effective in modulating plasmon-mediated photochemistry, however the realized chemical reactions are limited and the underlying mechanism is still unclear. Herein, by using in situ dark-field optical microscopy, the plasmon-mediated oxidative etching of silver nanoparticles (Ag NPs), a typical hot-hole-driven reaction, is monitored continuously and quantitatively. The presence of thiol or thiophenol molecules is found essential in the silver oxidation. In addition, the rate of silver oxidation is modulated by the choice of different thiol or thiophenol molecules. Compared with the molecules having electron donating groups, the ones having electron accepting groups accelerate the silver oxidation dramatically. The thiol/thiophenol modulation is attributed to the modulation of the charge separation between the Ag NPs and the adsorbed thiol or thiophenol molecules. This work demonstrates the great potential of molecular adsorption in modulating the plasmon-mediated photochemistry, which will pave a new way for developing highly efficient plasmonic photocatalysts.